Client Success
Thin Film Metrology System Software Reengineering
Wafer metrology systems incorporate a wide range of complex software capabilities. Metrology recipes provide an extremely rich palette of programmable behaviors. The control system must provide material handling, precise alignment and positioning and optics system control. Algorithms for reducing acquired data into meaningful measurement results are based on sophisticated mathematics. The good news is that the measurement capabilities of the tools are constantly improving, which provides huge benefits for semi fabs and a competitive advantage for the savvy equipment supplier. The bad news is that these improvements pose serious challenges for the maintenance of the underlying software.
